Accurate statistical process variation analysis for 0.25-μm CMOS with advanced TCAD methodology
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: IEEE Transactions on Semiconductor Manufacturing
سال: 1998
ISSN: 0894-6507
DOI: 10.1109/66.728554